Surface cleaning treatment of plasma equipment improves product ductility and wide cleaning equipment
Surface cleaning treatment of plasma equipment improves product ductility and wide cleaning equipment

Surface cleaning treatment of plasma equipment improves product ductility and wide cleaning equipment

Category:

Environmental Protection/Cleaning and cleaning equipment/Cleaning machine

Model:

CRF-APS- 500W

Brand:

CRF/Chengfeng Intelligent Manufacturing

Retail Price

108,000.00USD


重量

kg

  • Product Description
  • Description :

      Plasma cleaning machine, also known as plasma equipment. The basic principle is that during the cleaning process, the plasma generated by the gas under the action of the magnetic field during work produces physical and chemical changes with the surface of the object. The principle of physical reaction is that active particles bombard the surface to be cleaned, causing pollutants to escape from the surface and be discharged; The principle of chemical change is that various active particles react with pollutants to form volatile chemical substances, which are extracted to achieve the purpose of cleaning. Generally used as working gases such as hydrogen, nitrogen, oxygen, argon, etc.

    AfterSalesService :

    Key words:
    • Plasma equipment